Research for Etching Holographic Grating by the Ion Beam

According to the principle of separating amplitude of light wave,it is possible to give two beams of light that are able to interfere.At first,the ralief phase shift holographic grating is produced on a glass plate,on which a layer of aluminium has been evaporated,and then it is coated with thinner film of photoresist.After that the scintillating grating for the directive is microfabricated by the Ar-ion beam etching.There is no pariodic error on this grating.So far this technique is new in our country.We have made some experiments about the character of the photoresist PB-212 produced in our nation in the holographic exposure,development and etching by the collimated Ar-ion beam.In particular,the techniques of the etching Al-grating and the measure methods are investigaed.This paper descrebes the technotogy procedure mentioned above,discusses the calculation methods of the technical parameters,reports the results of the experiments and investigations.At the end of this paper,it is pointed out that the results of the experiments agree with calculation values and the future improvements.